Web9 de feb. de 1999 · The heated pedestal 150 used in the present invention is made of aluminum, and comprises a heating element 170 below the wafer support surface 151 of … WebOur most popular product categories include inline heaters, circulation heaters, semiconductor platens & wafer pedestal heaters, ... our thermal models aim to achieve consistency across the face of the heated component CAS is designing. Especially on flat heated surfaces, thermal consistency can be just as important as peak temperature.
A load lock for cooling wafers and a method of cooling the wafers
WebIn many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or platen may be cooling but the wafer gradually heats until the process can no longer continue. WebWafer temperatures up to 1200°C Clean operation and high reliability Substrate sizes from 1" up to 6" Oxygen resistance and customized solutions possible The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required. how many teaspoons in 3/4 oz
Novellus Systems 02-033134-00 200mm Wafer Pedestal Heater …
WebReferring to FIG. 1, the pedestal heater installed in the inner space of the reaction chamber 10 includes a molding heater body 30 and a heater body 30 made of metal such as … Web15 de nov. de 2000 · Abstract and Figures. A resistively heated, vacuum- and atmospheric-pressure-compatible, single-wafer furnace (SWF) system is designed to improve the operational flexibility of conventional ... WebAluminum 356 is the primary casting alloy for pedestal heaters, with exceptional compatibility for most process environments, and a maximum operating temperature of 450°C (840°F), with typical temperature … how many teaspoons in 3.5 oz